Accession Number:

ADA143779

Title:

Extensions of Electron Stimulated Desorption Measurements. Investigation of Gas Adsorption on Cu Layers Deposited on a Tungsten (110) Surface.

Descriptive Note:

Annual summary rept. 1 Jul 83-30 Jun 84,

Corporate Author:

CHICAGO UNIV IL JAMES FRANCK INST

Personal Author(s):

Report Date:

1984-06-30

Pagination or Media Count:

6.0

Abstract:

Work carried out consisted of determining energy thresholds for neutral CO, CO, and O from chemisorbed CO on W110 in electron stimulated desorption. Adsorption of CO and of oxygen on 1-4 Cu layers, adsorbed on a W110 crystal were studied by thermal desorption and photoelectron spectroscopy. It has been shown that the W substrate influences adsorption behavior for several Cu layers. There are chemical shifts in both CO and Cu indicating an electron drain away from both to the underlying W. For oxygen the sticking coefficient is increased relative to bulk Cu when 1 or 2 Cu layers are adsorbed on W, but then decreases rapidly.

Subject Categories:

  • Physical Chemistry

Distribution Statement:

APPROVED FOR PUBLIC RELEASE