Accession Number:

ADA143059

Title:

Plasma-Enhanced Chemical Vapor Deposition of Tungsten Films,

Descriptive Note:

Corporate Author:

CALIFORNIA UNIV BERKELEY

Personal Author(s):

Report Date:

1982-07-01

Pagination or Media Count:

4.0

Abstract:

Subject Categories:

  • Fabrication Metallurgy

Distribution Statement:

APPROVED FOR PUBLIC RELEASE