Accession Number:

ADA142183

Title:

Plasma Studies on Ion Diodes.

Descriptive Note:

Final rept. 15 Dec 81-15 Dec 82,

Corporate Author:

MASSACHUSETTS INST OF TECH CAMBRIDGE RESEARCH LAB OF ELECTRONICS

Personal Author(s):

• Bekefi,G.

Report Date:

1983-04-05

Pagination or Media Count:

36.0

Abstract:

Cathode plasmas in pulsed high current vacuum diodes have been studied using optical interferometry and spectroscopy. Both aluminum and graphite cathodes were used and the diode current density was varied over a factor of ten. The cathode plasma inventory was seen to increase during the length of the pulse and the plasma density was seen to increase with increasing current density. Spectral line emission from H, CI, CII, and CIII was observed when either cathode was used. It is concluded that cathode was used. it is concluded that cathode plasma expansion is dominated by protons from cathode surface contaminants. Author

Descriptors:

• *DIODES
• *IONS
• *PLASMAS(PHYSICS)
• VACUUM
• CURRENT DENSITY
• GRAPHITE
• PROTONS
• CATHODES
• INTERFEROMETRY
• ALUMINUM
• CONTAMINANTS
• EXPANSION
• SPECTRAL EMITTANCE

Subject Categories:

• Electrical and Electronic Equipment
• Plasma Physics and Magnetohydrodynamics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE