Synthesis and Evaluation of Improved Electron-Beam and X-Ray Lithographic Resist Polymers.
Final rept. 1 Jul 79-31 Dec 81,
ALABAMA UNIV UNIVERSITY
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It was the goal of this research to investigate the relationship between the chemical structure of polymers and the properties which would result in a new generation of lithographic resists for electron-beam and X-ray lithography. Thus, the synthesis of a variety of vinyl homopolymers, copolymers and terpolymers was undertaken where quaternary centers were present along the polymer backbone. Author
- Polymer Chemistry