Accession Number:

ADA141674

Title:

Synthesis and Evaluation of Improved Electron-Beam and X-Ray Lithographic Resist Polymers.

Descriptive Note:

Final rept. 1 Jul 79-31 Dec 81,

Corporate Author:

ALABAMA UNIV UNIVERSITY

Personal Author(s):

Report Date:

1984-05-01

Pagination or Media Count:

9.0

Abstract:

It was the goal of this research to investigate the relationship between the chemical structure of polymers and the properties which would result in a new generation of lithographic resists for electron-beam and X-ray lithography. Thus, the synthesis of a variety of vinyl homopolymers, copolymers and terpolymers was undertaken where quaternary centers were present along the polymer backbone. Author

Subject Categories:

  • Polymer Chemistry
  • Plastics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE