Accession Number:
ADA141674
Title:
Synthesis and Evaluation of Improved Electron-Beam and X-Ray Lithographic Resist Polymers.
Descriptive Note:
Final rept. 1 Jul 79-31 Dec 81,
Corporate Author:
ALABAMA UNIV UNIVERSITY
Personal Author(s):
Report Date:
1984-05-01
Pagination or Media Count:
9.0
Abstract:
It was the goal of this research to investigate the relationship between the chemical structure of polymers and the properties which would result in a new generation of lithographic resists for electron-beam and X-ray lithography. Thus, the synthesis of a variety of vinyl homopolymers, copolymers and terpolymers was undertaken where quaternary centers were present along the polymer backbone. Author
Descriptors:
Subject Categories:
- Polymer Chemistry
- Plastics