Accession Number:

ADA141602

Title:

Photoemission Studies of Reactive Diffusion and Localized Doping at II- VI Compound Semiconductor-Metal Interfaces,

Descriptive Note:

Corporate Author:

XEROX WEBSTER RESEARCH CENTER NY

Personal Author(s):

• Brillson, L. J.
• Brucker, C. F.
• Stoffel, N. G.
• Katnani, A.
• Daniels, R.

Report Date:

1983-03-01

Pagination or Media Count:

4.0

Abstract:

Descriptors:

• *INTERFACES
• *METALS
• *PHOTOELECTRIC EMISSION
• *SEMICONDUCTORS
• CHEMICAL BONDS
• CHEMICAL REACTIONS
• DIFFUSION
• DOPING
• EMISSION SPECTROSCOPY
• REPRINTS
• SCHOTTKY BARRIER DEVICES
• SOFT X RAYS

Subject Categories:

• Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE