Topical Meeting on Optical Bistability Held at Rochester, New York on 15-17 June 1983.
Final rept. 1 Jun 83-31 Jan 84,
OPTICAL SOCIETY OF AMERICA WASHINGTON D C
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The topical meeting on optical bistability was intended to provide an international interdisciplinary forum for the exchange of knowledge on the progress of various aspects of optical bistability and optical nonlinearities. Papers in the following areas were covered theory, experiments, devices, material properties, instabilities and chaos and coherent switching. Author