Laser Chemical Vapor Deposition.
Final scientific rept.,
UNIVERSITY OF SOUTHERN CALIFORNIA LOS ANGELES CENTER FOR LASER STUDIES
Pagination or Media Count:
Metal, dielectric and semiconductor films have been deposited by laser chemical vapor deposition LCVD using both pulsed and cw laser sources on a variety of substrates. For LCVD on substrates such as quartz, the deposition was monitored optically in both transmission and reflection using a collinear visible laser and the depositing CO2 laser. Deposition initiation and rate were correlated with irradiation conditions, the laser generated surface temperature, and the changing optical properties of the filmsubstrate during deposition. Single crystallites of W greater than 100 micrometers tall were deposited using a Kr laser on Si substrates. Author
- Lasers and Masers
- Fabrication Metallurgy
- Solid State Physics