Accession Number:

ADA136118

Title:

Characterization of Crystallographic Structure and Internal Stress of Chromium Coatings Plated under Current Interruptions.

Descriptive Note:

Final rept.,

Corporate Author:

ARMY ARMAMENT RESEARCH AND DEVELOPMENT CENTER WATERVLIET NY LARGE CALIBER WEAPON SYSTEMS LAB

Personal Author(s):

Report Date:

1983-09-01

Pagination or Media Count:

23.0

Abstract:

The effect of interrupted current IC plating on the visual crack morphology, crystallography, and residual stresses of electrodeposited chromium has been investigated. Varying the process parameters such as the onoff plating cycle and current density resulted in changing the crystallographic fiber texture of the deposit from the conventional 111 orientation to a combination of 211, 111, and a small fraction of randomly oriented crystallites. Under these plating conditions, it was also found that 1 lower amounts of chromium hydride CrHx occur in the deposit, 2 a large decrease in the microcrack density of the deposit occurs, and 3 the deposits tend to become compressively stressed.

Subject Categories:

  • Properties of Metals and Alloys
  • Fabrication Metallurgy
  • Crystallography
  • Mechanics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE