Accession Number:

ADA134095

Title:

Laser Photodeposition and Photoetching Study.

Descriptive Note:

Progress rept. 1 Jan-31 Mar 83,

Corporate Author:

MASSACHUSETTS INST OF TECH LEXINGTON LINCOLN LAB

Personal Author(s):

Report Date:

1983-03-31

Pagination or Media Count:

29.0

Abstract:

Work during this quarter has developed a new technique for direct-write etching of Al and AlSiCu alloys, and has applied this new process to correction of bridging faults in VLSI signal-processing circuits. Additional work has expanded upon two excimer-laser resist processes to develop fast deep-UV lithographic procedures based on these powerful UV sources. A final series of experiments has extended pulsed UV-laser reactions to area photodeposition of Al203 films.

Subject Categories:

  • Electrical and Electronic Equipment
  • Lasers and Masers
  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE