Accession Number:

ADA123463

Title:

Ion-Beam Deposition of Nb and Ta Refractory Superconducting Films,

Descriptive Note:

Corporate Author:

YALE UNIV NEW HAVEN CONN

Personal Author(s):

Report Date:

1982-01-01

Pagination or Media Count:

15.0

Abstract:

In this paper we report on the electrical, superconducting, and structural properties of ion-beam deposited Nb and Ta films produced using a Kaufman ion source. We find that after careful optimization of ion gun parameters and the use of Xe gas, this technique is capable of reproducibly depositing high quality superconducting Nb films on room temperature substrates. The deposition conditions are, in fact, less stringent than for e-beam or planar sputtering systems. We also find that by employing a multiple target capability, high quality Ta films can be produced under the same conditions by first depositing a thin underlayer of Nb. Author

Subject Categories:

  • Fabrication Metallurgy
  • Crystallography
  • Electricity and Magnetism

Distribution Statement:

APPROVED FOR PUBLIC RELEASE