Accession Number:

ADA109818

Title:

An Ultrasensitive Electron (Soft X-Ray) Silver Halide/Chalcogenide Negative or Positive Inorganic Resist.

Descriptive Note:

Final rept.,

Corporate Author:

GCA CORP BEDFORD MASS GCA TECHNOLOGY DIV

Personal Author(s):

Report Date:

1981-12-01

Pagination or Media Count:

35.0

Abstract:

We have successfully Ag-photodoped As2S3 using photographic Ag derived from evaporated AgBr. The use of evaporated AgBr has resulted in a 1000-fold increase in speed. We have shown that evaporated AgBr has very high sensitivity in the deep UV 50 microJcm2 at 2600 angstrnoms, at soft x-ray wavelengths 5 microJcm2 at 7 angstrnoms and confirmed the previously observed e-beam sensitivity of 10-9 coulombscm2. We have shown the feasibility of using evaporated AgBr as the photon sensitive layer of a multi-layer photoresist system for submicron lithography. Author

Subject Categories:

  • Atomic and Molecular Physics and Spectroscopy
  • Nuclear Physics and Elementary Particle Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE