An Ultrasensitive Electron (Soft X-Ray) Silver Halide/Chalcogenide Negative or Positive Inorganic Resist.
GCA CORP BEDFORD MASS GCA TECHNOLOGY DIV
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We have successfully Ag-photodoped As2S3 using photographic Ag derived from evaporated AgBr. The use of evaporated AgBr has resulted in a 1000-fold increase in speed. We have shown that evaporated AgBr has very high sensitivity in the deep UV 50 microJcm2 at 2600 angstrnoms, at soft x-ray wavelengths 5 microJcm2 at 7 angstrnoms and confirmed the previously observed e-beam sensitivity of 10-9 coulombscm2. We have shown the feasibility of using evaporated AgBr as the photon sensitive layer of a multi-layer photoresist system for submicron lithography. Author
- Atomic and Molecular Physics and Spectroscopy
- Nuclear Physics and Elementary Particle Physics