Stability of Optical Coatings in Hostile Excimer Laser Environments
Annual technical rept., 1 Jul 1980-30 Jun 1981
WASHINGTON STATE UNIV PULLMAN DEPT OF PHYSICS
Pagination or Media Count:
E-beam evaporated SiO2 films were investigated during and after exposure to XeF laser gas components. Experimental methods and results are described, indicating that i impurities in the films reduce chemical film stability even without laser photons present ii low energy ions from the laser plasma enhance film decomposition iii mirror substrate temperature between room temperature and 100 C does not influence etching significantly.
- Lasers and Masers