Accession Number:

ADA106097

Title:

High Dose Rate Electron Beam Testing.

Descriptive Note:

Final rept. 1 Mar-30 Sep 80,

Corporate Author:

MISSION RESEARCH CORP LA JOLLA CA

Personal Author(s):

• Wrobel,T. F.

Report Date:

1980-12-01

Pagination or Media Count:

45.0

Abstract:

A test program was designed to investigate test methods utilized for high dose rate e-beam testing of semiconductor components. Several methods used to vary the exposure dose were investigated including the variation of drift chamber pressure and length as well as beam aperturing. The photo response obtained for a 1N916 diode at the HIFX and Hermes facilities were in agreement for the various modes of apparation. In addition, it was found that acceptable dose measurements can be performed at the high intensities if the dosimeters are placed in close proximity to the device under test. Author

Descriptors:

• *SEMICONDUCTOR DEVICES
• *ELECTRON BEAMS
• *DOSIMETRY
• EXPERIMENTAL DESIGN
• DAMAGE ASSESSMENT
• APERTURES
• RADIATION EFFECTS
• THERMOLUMINESCENCE

Subject Categories:

• Radioactivity, Radioactive Wastes and Fission Products
• Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE