Accession Number:

ADA101837

Title:

C-V and Capacitance Transient Analysis of Self-Implanted Amorphous Regrown by Swept-Line Electron Beam (SLEB) Annealing,

Descriptive Note:

Corporate Author:

ILLINOIS UNIV AT URBANA-CHAMPAIGN

Personal Author(s):

• Soda, K. J.
• DeJule, R. Y.
• Streetman, B. G.

Report Date:

1981-01-01

Pagination or Media Count:

9.0

Abstract:

Descriptors:

• *AMORPHOUS MATERIALS
• *ANNEALING
• *ELECTRON BEAMS
• *SILICON
• CAPACITANCE
• REPRINTS
• TRANSIENTS

Subject Categories:

• Particle Accelerators
• Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE