Highintensity Pulsed Plasma X-Ray Source for Micolithography.
Interim rept. 30 Sep-31 Dec 80,
AVCO EVERETT RESEARCH LAB INC EVERETT MA
Pagination or Media Count:
The objective of the program is to perform a design study for a laser-driven, high-intensity pulsed plasma source for X-ray lithography, including a consideration of the effects of such a source on the X-ray mask structures. During this initial quarterly period, work has begun on the design for the CO2 laser driver, as well as on an analysis of the constraints imposed upon the pulsed X-ray source parameters due to thermally-induced stress damage to the mask. The complete design for the CO2 laser system must include several subsystems, the most important being the power amplifier module PAM. During this reporting period, the conceptual design and operating parameters for the PAM have been developed, and tradeoff studies at the interfaces of support systems have been outlined. Also during this period, a scoping analysis has been performed to examine some of the influences of both x-ray source and mask geometry upon mask thermal stress constraints. Using an analytical model, parametric variation with respect to mask substrate thickness, X-ray wavelength, and X-ray pulselength has been carried out. In addition, some effects of mask configuration have been investigated. These preliminary studies are intended to give an insight into the phenomenology involved in the interaction between intense pulsed X-ray sources and potential mask damage mechanisms.
- Manufacturing and Industrial Engineering and Control of Production Systems
- Printing and Graphic Arts