Accession Number:

ADA093843

Title:

Numerical Methods for 2-Dimensional Modeling

Descriptive Note:

Semi-annual technical rept. 1 Jul-31 Dec 1980

Corporate Author:

ROCKWELL INTERNATIONAL CORP THOUSAND OAKS CA SCIENCE CENTER

Personal Author(s):

• Murphy, W. D.
• Hall, W. F.

Report Date:

1980-12-01

Pagination or Media Count:

41.0

Abstract:

Progress toward the development of a fast algorithm for two- dimensional computational modeling of VLSI fabrication processes is described. The first report of an algorithm producing two-dimensional dopant profiles in seconds per process step is presented. A summary of investigations to date and plans for future work are discussed.

Descriptors:

• *INTEGRATED CIRCUITS
• *MATHEMATICAL MODELS
• *NUMERICAL METHODS AND PROCEDURES
• *TWO DIMENSIONAL
• ALGORITHMS
• BOUNDARY VALUE PROBLEMS
• COMPLEX VARIABLES
• DOPING
• FABRICATION
• PARAMETERS
• SAPPHIRE
• SILICON
• SPLINES(GEOMETRY)

Subject Categories:

• Electrical and Electronic Equipment
• Theoretical Mathematics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE