Numerical Methods for 2-Dimensional Modeling
Semi-annual technical rept. 1 Jul-31 Dec 1980
ROCKWELL INTERNATIONAL CORP THOUSAND OAKS CA SCIENCE CENTER
Pagination or Media Count:
Progress toward the development of a fast algorithm for two- dimensional computational modeling of VLSI fabrication processes is described. The first report of an algorithm producing two-dimensional dopant profiles in seconds per process step is presented. A summary of investigations to date and plans for future work are discussed.
- Electrical and Electronic Equipment
- Theoretical Mathematics