An Ultrasensitive Electron (Soft X-Ray) Silver Halide/Chalcogenide Negative or Positive Inorganic Resist.
Annual rept. no. 1, 10 Sep 79-15 Oct 80,
IONOMET CO INC BRIGHTON MA
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We have successfully Ag-photodoped As2S3 using photographic Ag derived from evaporated AgBr. The use of evaporated AgBr has resulted in a 1000-fold increase in speed. We have shown that evaporated AgBr has very high sensitivity in the deep UV 50 microJsq cm at 2600 Angstroms, at soft x-ray wavelengths 5 microJsq cm at 7 Angstrom and confirmed the previously observed e-beam sensitivity of 10 to the minus 9th power coulombssq cm. We have shown the feasibility of using evaporated AgBr as the photon sensitive layer of a multi-year photoresist system for sub-micron lithography. Author
- Printing and Graphic Arts