Accession Number:
ADA093450
Title:
An Ultrasensitive Electron (Soft X-Ray) Silver Halide/Chalcogenide Negative or Positive Inorganic Resist.
Descriptive Note:
Annual rept. no. 1, 10 Sep 79-15 Oct 80,
Corporate Author:
IONOMET CO INC BRIGHTON MA
Personal Author(s):
Report Date:
1980-11-10
Pagination or Media Count:
46.0
Abstract:
We have successfully Ag-photodoped As2S3 using photographic Ag derived from evaporated AgBr. The use of evaporated AgBr has resulted in a 1000-fold increase in speed. We have shown that evaporated AgBr has very high sensitivity in the deep UV 50 microJsq cm at 2600 Angstroms, at soft x-ray wavelengths 5 microJsq cm at 7 Angstrom and confirmed the previously observed e-beam sensitivity of 10 to the minus 9th power coulombssq cm. We have shown the feasibility of using evaporated AgBr as the photon sensitive layer of a multi-year photoresist system for sub-micron lithography. Author
Descriptors:
Subject Categories:
- Printing and Graphic Arts