Accession Number:

ADA093316

Title:

Chemical Reactions at the Metal/Silicon Interface.

Descriptive Note:

Final rept. 1 Aug 79-31 Oct 80,

Corporate Author:

IBM THOMAS J WATSON RESEARCH CENTER YORKTOWN HEIGHTS NY

Personal Author(s):

Report Date:

1980-10-31

Pagination or Media Count:

96.0

Abstract:

This report includes the studies of Si111 and Si100 surfaces with Pd, Pt, Ni, and V metal overlayers leading to silicide formation. Experimental techniques utilized include ultraviolet photoemission spectroscopy, Auger electron spectroscopy, work function measurements and transmission electron microscopy.

Subject Categories:

  • Organic Chemistry
  • Atomic and Molecular Physics and Spectroscopy

Distribution Statement:

APPROVED FOR PUBLIC RELEASE