Development of an Electrophoretic Image Display
Quarterly technical rept. no. 2, 1 Nov 1979-31 Jan 1980
PHILIPS LABS BRIARCLIFF MANOR NY
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The size of the ion-beam milled control-grid structure was increased to 2.0 in. x 2.6 in. from 0.75 in. x 0.75 in. the diameter of the uniform area is 2.7 in. Fabrication techniques for this larger size are being developed. The design of a working display is nearly complete. Using the results of the computer model, the dimensions of the display were chosen. The potential wells will be 30 micrometers x 102 micrometers with 6 micrometers wide walls. The maximum separation between electrodes will be 62 micrometers, and the wells with be 12 micrometers deep. The display will have 16 rows of 32 characters in a 5 x 7 dot matrix font with a resolution of 2 1pmm. The active area will be 2.22 in. x 1.43. in and contain 32,224 pixels. It was decided to use In2O3 as the material for the grid electrode instead of aluminum deposition of the In2O3 will begin as soon as the sputtering system is modified.
- Test Facilities, Equipment and Methods