Accession Number:

ADA080169

Title:

Design of a Digital Controller for an Electron Beam Lithography System.

Descriptive Note:

Master's thesis,

Corporate Author:

AIR FORCE INST OF TECH WRIGHT-PATTERSON AFB OH SCHOOL OF ENGINEERING

Personal Author(s):

Report Date:

1979-12-01

Pagination or Media Count:

246.0

Abstract:

A digital controller for an electron beam lithography system was designed using microprocessor technology. Due to the high speed requirements of the system the hardware controller was implemented using a microprogram sequencer. The controller was designed as a special purpose computer. The word length of the controller computer is 40 bits. The first twenty-three bits are control bits. The other seventeen bits are used to determine which word to execute next. A Z-80A microcomputer was used in the design as an inputoutput device. The Z-80A outputs the pattern data. The controller uses that data and sequences the electron beam to draw the requested pattern. The controller is double buffered for increased throughput. Since both the controller and the Z-80A are programmable, the capabilities of the system can be tailored to the needs of the user. Author

Subject Categories:

  • Computer Programming and Software
  • Computer Hardware
  • Manufacturing and Industrial Engineering and Control of Production Systems

Distribution Statement:

APPROVED FOR PUBLIC RELEASE