Experimental Investigations of XeF2 for Possible Laser Applications.
Technical rept. 1 Dec 77-30 Sep 78,
FRANK J SEILER RESEARCH LAB UNITED STATES AIR FORCE ACADEMY COLO
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The feasibility of the use of xenon difluoride as the oxidant for an HF or DF chemical laser system was investigated. The basic research that was accomplished to provide information for this study included spectral studies, photodissociation and thermal dissociation of the xenon difluoride. The absorption spectrum of xenon difluoride confirmed the literature result. Attempts to detect radical thermal or photodissociation products via electron spin resonance spectrometry were unsuccessful. Due to these negative results it was concluded that xenon difluoride would not be a good candidate for the oxidant in a chemical laser system. Author
- Lasers and Masers
- Atomic and Molecular Physics and Spectroscopy