Techniques for the Microfabrication of Integrated Optical Waveguide Couplers.
Final rept. 14 Apr 76-13 Jan 77,
SRI INTERNATIONAL MENLO PARK CA
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This report covers the development of techniques for the microfabrication of integrated optical waveguide couplers. In particular an Electron Projection Exposure System EPES, that uses a large-area electron beam to image an object transmission mask with a size reduction of a factor of twenty, was studied in detail. Techniques for fabricating transmission masks for EPES were successfully developed. Additional features were added to the original SRI electron optical column to make it applicable for IO device lithography, including mask alignment fixtures, a sample stage with external positioning drivers with a precision of 1000 A, and an electron projection lens with a resolution of 0.5 microns and an edge sharpness of 500 A. However, the problem of uniformly illuminating the object transmission mask with electrons proved to be extremely difficult to resolve, and for this reason the fabrication of a complete optical waveguide coupler using the EPES technique was not attempted. Techniques for indiffusing titanium strips on a lithium niobate substrate to obtain planar guides were developed, and attempts were made to produce devices using optical contact lithography and a high resolution mask supplied from an external vendor via NRL. Author
- Nuclear Physics and Elementary Particle Physics