Accession Number:

ADA048307

Title:

IC Fabrication Using Electron-Beam Technology.

Descriptive Note:

Quarterly rept. no. 2, 1 Dec 76-1 Mar 77,

Corporate Author:

TEXAS INSTRUMENTS INC DALLAS

Personal Author(s):

• Varnell,Gilbert L.
• Williamson,Ronald A.
• Brewer,Terry L.
• Bartelt,John L.
• Robbins,Roger A.

Report Date:

1977-07-01

Pagination or Media Count:

36.0

Abstract:

The technical and economic impact of electron-beam direct slice printing will be demonstrated on 256-bit bipolar RAMs. All electron-beam tapes necessary for fabricating the 256-bit bipolar RAMs have been generated. Advanced software techniques such as geometry sizing, sorting and incrementdecrement were used. E-beam processes have been developed for all lithographic steps on the 256-bit bipolar RAMs. Because of the pattern distortion at epitaxial growth, the original alignment marker system was modified. Several lots using this new alignment marker system are in process. The design of the Automatic Slice Loader is complete. Author

Descriptors:

• *FABRICATION
• *INTEGRATED CIRCUITS
• *ELECTRON BEAMS
• EPITAXIAL GROWTH
• ETCHING
• RANDOM ACCESS COMPUTER STORAGE
• ALIGNMENT
• LITHOGRAPHY
• SCHOTTKY BARRIER DEVICES
• BIPOLAR SYSTEMS
• METALLIZING

Subject Categories:

• Electrical and Electronic Equipment
• Manufacturing and Industrial Engineering and Control of Production Systems

Distribution Statement:

APPROVED FOR PUBLIC RELEASE