Accession Number:

ADA048019

Title:

The Effect of Ion Irradiation on the Intrinsic Stress and Substrate Adhesion of Germanium Films.

Descriptive Note:

Technical rept.,

Corporate Author:

WEAPONS RESEARCH ESTABLISHMENT SALISBURY (AUSTRALIA)

Personal Author(s):

Report Date:

1977-08-01

Pagination or Media Count:

13.0

Abstract:

Irradiation with argon ions is shown to increase greately the adhesion of vacuum evaporated Germanium films on glass and other substrates. The observations suggest that the effect is due to the penetration of Ge atoms into the substrate after collison with the energetic ions. In addition, the intrinsic stress of films deposited under ion bombardment is found to be substantially lower than that of similar fimls, produced without simultaneous irradiation. Author

Subject Categories:

  • Metallurgy and Metallography
  • Radioactivity, Radioactive Wastes and Fission Products

Distribution Statement:

APPROVED FOR PUBLIC RELEASE