The Effect of Ion Irradiation on the Intrinsic Stress and Substrate Adhesion of Germanium Films.
WEAPONS RESEARCH ESTABLISHMENT SALISBURY (AUSTRALIA)
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Irradiation with argon ions is shown to increase greately the adhesion of vacuum evaporated Germanium films on glass and other substrates. The observations suggest that the effect is due to the penetration of Ge atoms into the substrate after collison with the energetic ions. In addition, the intrinsic stress of films deposited under ion bombardment is found to be substantially lower than that of similar fimls, produced without simultaneous irradiation. Author
- Metallurgy and Metallography
- Radioactivity, Radioactive Wastes and Fission Products