Accession Number:

ADA045536

Title:

Chemical Vapor Deposition of Silicon Nitride.

Descriptive Note:

Summary rept. 1 Apr 76-31 Aug 77,

Corporate Author:

GENERAL ELECTRIC CO PHILADELPHIA PA RE-ENTRY AND ENVIRONMENTAL SYSTEMS DIV

Report Date:

1977-09-01

Pagination or Media Count:

66.0

Abstract:

Experimental work during the past year has established the basic processing outlines for the deposition of crystalline alpha-Si3N4 plates and dome geometries. Preliminary correlations between critical processing variables and microstructure have been established. Property evaluations of deposits include flexure strength, Youngs moduli, thermal expansion, electromagnetic transmittance and reflectance, microhardness and fracture toughness deduced from identation and grooved double-cantilever beam experiments. Author

Subject Categories:

  • Coatings, Colorants and Finishes
  • Active and Passive Radar Detection and Equipment
  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE