Characterization of Insulating Regions Created in Silicon-on-Sapphire by Ion Implantation.
Final technical rept. 1 Oct 74-31 Aug 75,
HUGHES RESEARCH LABS MALIBU CALIF
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This research program was concerned with the fabrication of isolation electrically insulating regions in silicon-on-sapphire SOS wafers for application to integrated circuit technology, radiation hard MOS ICs in particular.
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- Manufacturing and Industrial Engineering and Control of Production Systems
- Solid State Physics