Analysis of Electronic Component Damage Due to EMP.
Final technical rept. Jan-Jun 76,
FRANK J SEILER RESEARCH LAB UNITED STATES AIR FORCE ACADEMY COLO
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Carbon composition, metal film, carbon film, and metal oxide type resistors, damaged with electromagnetic pulses EMP of 0.1 microsec to 10 microsec, have been examined using a scanning electron microscope SEM. Failure mechanisms as a function of EMP pulsewidth were investigated with specific interest in arcing failure at short pulsewidths. Evidence of arcing damage was found in all three film type resistors associated with the helix trimming cut in the film layer. Theoretical electric field potential profiles of the resistive film layer are supported by SEM photographs. This project was supported by AFWLDYX, P.O. AFWL 76-201, through Frank J. Seiler Research Laboratory, W.U. 7903-03-88. Author
- Electrical and Electronic Equipment
- Nuclear Radiation Shielding, Protection and Safety
- Radioactivity, Radioactive Wastes and Fission Products