Ion Beam Sputtering of Infrared Optical Materials
Technical research rept.
FRANKFORD ARSENAL PHILADELPHIA PA
Pagination or Media Count:
The sputter yield and morphological characteristics of materials commonly employed for infrared optical elements is described. A method to utilize a numerically controlled low energy ion beam to figure and polish infrared optical elements is presented. This method is capable of forming highly accurate large aperture optical elements without degrading optical performance by the introduction of trace impurities.
- Fabrication Metallurgy