Accession Number:

ADA021779

Title:

Effects of Gamma Ray Irradiation on HCl Oxides.

Descriptive Note:

Doctoral thesis,

Corporate Author:

ROME AIR DEVELOPMENT CENTER GRIFFISS AFB N Y

Personal Author(s):

• McGinn,James N.

Report Date:

1976-01-01

Pagination or Media Count:

84.0

Abstract:

Silicon dioxide films grown in the presence of controlled amounts of gaseous HCl and O2 at 1125 C have been irradiated by gamma rays from a Cobalt-60 gamma source, up to total dose levels of 1,000,000 rad Si. The mole percentage ratios of HClO2 used during the gate oxide formation were 0, 1, 4, and 6 percent, where the 0 percent oxides represented those oxides grown in pure oxygen following tube cleaning by a mixture of HCl and O2. The effects of irradiation on these oxides as a function of the mole percentage ratios HClO2 introduced during oxide formation have been monitored for various gate bias and radiation dose levels. It has been shown that the addition of HCl gas to the oxidizing ambient alters the structure of the resulting oxide in such a way as to increase the number of hole trapping sites available during irradiation. The magnitude of the hole traps formed in the oxide increased as the mole percentage ratio HClO2 increased. It has also been observed that, in general, the number of radiation-induced surface states increased as the mole percentage ratio HClO2 increased. This is attributed primarily to the breaking of Si-H bonds that were formed during oxide formation. Author

Descriptors:

• *INSULATION
• *METAL OXIDE SEMICONDUCTORS
• *RADIATION HARDENING
• INTERFACES
• SILICON DIOXIDE
• GATES(CIRCUITS)
• HOLES(ELECTRON DEFICIENCIES)
• DIELECTRIC FILMS
• OXYGEN
• GAMMA RAYS
• HYDROGEN CHLORIDE
• CONTROLLED ATMOSPHERES

Subject Categories:

• Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE