Self-Diffusion in Silicon Nitride.
Final technical rept. 1 Jan 73-31 Mar 75,
AVCO CORP LOWELL MASS SYSTEMS DIV
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Results are described for a two-year program intended to develop techniques for simultaneous measurement of Si and N self-diffusion in silicon nitride. A variety of materials were acquired and characterized. The materials examined included both alpha and beta forms of pure Si3N4 plus a variety of sialons. The specimens selected for measurement were a dense, high purity alpha and a dense, commercial-grade beta silicon nitride.
- Ceramics, Refractories and Glass
- Atomic and Molecular Physics and Spectroscopy