Accession Number:

ADA021175

Title:

Self-Diffusion in Silicon Nitride.

Descriptive Note:

Final technical rept. 1 Jan 73-31 Mar 75,

Corporate Author:

AVCO CORP LOWELL MASS SYSTEMS DIV

Personal Author(s):

Report Date:

1975-01-01

Pagination or Media Count:

49.0

Abstract:

Results are described for a two-year program intended to develop techniques for simultaneous measurement of Si and N self-diffusion in silicon nitride. A variety of materials were acquired and characterized. The materials examined included both alpha and beta forms of pure Si3N4 plus a variety of sialons. The specimens selected for measurement were a dense, high purity alpha and a dense, commercial-grade beta silicon nitride.

Subject Categories:

  • Ceramics, Refractories and Glass
  • Atomic and Molecular Physics and Spectroscopy

Distribution Statement:

APPROVED FOR PUBLIC RELEASE