Accession Number:

ADA011723

Title:

Chemical Vapor Deposition of Cadmium Telluride

Descriptive Note:

Final technical rept. 1 Jun 1973-31 Jan 1975

Corporate Author:

RAYTHEON CO WALTHAM MA RESEARCH DIV

Personal Author(s):

Report Date:

1975-03-01

Pagination or Media Count:

67.0

Abstract:

Cadmium telluride CdTe is a promising material for use as high power laser windows. In the fabrication processes used prior to this work difficulties were experienced in controlling the structural perfection and purity of the material. The chemical vapor deposition process offers the promise of overcoming some of the difficulties experienced to date. The first phase involved the investigation of several processes for the CVD of CdTe. The specific processes investigated and evaluated were 1 dimethyl cadmium and dimethyl tellurium vapors 2 dimethyl cadmium and tellurium metal vapors 3 dimethyl cadmium vapor and H2Te gas 4 cadmium metal and dimethyl tellurium vapors and 5 Cd and Te vapors and 6 H2Te gas and Cd vapor. The second phase involved the task of process optimization. The process parameters which were determined to be of importance were deposition temperature, furnace pressure, and molar ratio of the reactants. The third phase involved the evaluation and measurement of the various process parameters such as deposition rate and profile, as well as the structure and properties of CdTe.

Subject Categories:

  • Lasers and Masers
  • Crystallography
  • Optics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE