A Comparison of 10.6 micrometer Pulsed Laser Damage in Sputtered vs Electron Beam Deposited Ge-Coated KCl,
AIR FORCE CAMBRIDGE RESEARCH LABS HANSCOM AFB MASS
Pagination or Media Count:
Germanium films deposited on KCl substrates by electron beam and sputter techniques have been irradiated at 10.6 micrometers. A comparative damage study of germanium films prepared by these techniques under pulsed apparatus was used for this study. Well characterized RAP Bridgeman and Czochralski grown KCl substrates with 100 and 111 orientation were used.
- Lasers and Masers