Techniques for the Microfabrication of Integrated Optical Waveguide Couplers
Quarterly technical rept. no. 1, 24 Jan-24 Apr 1975
STANFORD RESEARCH INST MENLO PARK CA
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During this quarter progress was made toward accomplishing the objective of this program, namely, the development of an electron-beam projection exposure system EPES capable of producing integrated optical circuits. Efforts were concentrated on basic improvements in the electron exposure system to increase the area of exposure for a single pattern and to develop methods of producing multiple-registered exposure patterns. The results obtained thus far are 1 The EPES illumination system has been improved to provide an area of illumination 100 larger than that of the previous system 2 A rotary mask holder has been designed, which will allow the formation of up to eight different registered exposure patterns. Concentrated research work has also been carried out to develop the transmission mask fabrication technology to allow reproducible electron-beam mask construction.
- Fiber Optics and Integrated Optics