Investigation of Advanced Protective and Antireflection Coatings for Halide Optics
Final rept. 1 Jun 1973-19 Apr 1974
ROCKWELL INTERNATIONAL ANAHEIM CA AUTONETICS GROUP
Pagination or Media Count:
A chemical etch procedure using a solution of 91 parts of glacial acetic acid to 9 parts of concentrated hydrochloric acid was developed for polishing the potassium chloride. Thin film polymeric coatings were prepared by radio frequency glow discharge and ultraviolet techniques and proper equipment has been assigned and assembled. Hexachlorobutadiene - 1.3 was used as monomer for preparation of polymeric coatings. Glow discharge polymerization was occuring primarily in the vapor phase rather than on the substrate surface thereby establishing the proper mathematical relationship between the monomer vapor pressure, flow rate, substrate temperature, power, inert gas pressure, flow substrate to-power source spacing and deposition rate. The thin film polymeric coating showed a slight absorption at 10.6 micrometers and little or no absorption at 3 to 5 micrometers. The coating demonstrated good adhesion to the substrate. The very low coating deposition rates obtained by ultraviolet photolytic polymerization of low pressure materials make this process unattractive for this type of materials.
- Lasers and Masers
- Coatings, Colorants and Finishes