Accession Number:

AD1078140

Title:

Acquisition of an Advanced Atomic Layer Deposition System for Research at Nanoscale for Energy Harvesting and Nanoelectronics at Alabama A and M University

Descriptive Note:

Technical Report,05 Sep 2017,04 Sep 2018

Corporate Author:

Alabama A and M University Normal United States

Report Date:

2019-01-09

Pagination or Media Count:

29.0

Abstract:

The major goal of this project is to acquire a state-of-the-art KJLC 150-LX atomic layer deposition ALD system to enable researchers at the Alabama A and M University AAMU to fabricate devices at the micro- and nanoscales. The capability of fabricating materials and devices at nanoscale is critical not only for the advancement of science and technology, but also for the training of the future scientific workforce. One of the key capabilities for micro and nanofabrication is the ability to grow nanoscale thin-film materials. Physical vapor deposition PVD and chemical vapor deposition CVD are two major methods to grow thin-film materials. Our PVD thin-film deposition capability is excellent we have both sputtering deposition system and thermale-beam evaporation system for physical vapor deposition PVD of thin-film materials. However, we didnt have any chemical vapor deposition CVD system in our clean room. CVD has advantage over PVD such as having higher film quality and better film conformity, which are critical in the fabrication at nanoscales. The atomic layer deposition ALD is chemical vapor deposition CVD. The requested atomic layer deposition system is necessary companion instruments to our 2,500 sq. ft class 1,000 clean-room fabrication tools. The acquisition of the ALD system would propel nanoscale science and technology at AAMU serving northern Alabama to new frontiers.

Subject Categories:

  • Test Facilities, Equipment and Methods
  • Industrial Chemistry and Chemical Processing
  • Electrical and Electronic Equipment

Distribution Statement:

APPROVED FOR PUBLIC RELEASE