Advanced Multilayer Physical Vapor Deposition Tool
Technical Report,17 Apr 2017,16 Jul 2018
North Carolina State University Raleigh United States
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PI Maria received ARO support for a high throughput dedicated physical vapor deposition tool for the production of polaritonic conducting metal oxides and reactive nanolaminates with in situ thickness control, stable sputter cathode sources, the ability to control acceptor and donor doping in the range between high 1017cm-3 and mid 1020 cm-3, and an integrated variable pressure annealing station. The configuration proposed is designed specifically to propel the new NCSU- led MURI program Multi-modal Energy Flow at Atomically Engineered Interfaces but will also benefit a broad set of existing ONR, DoD, and NSF research programs.
- Electrical and Electronic Equipment
- Plasma Physics and Magnetohydrodynamics