Hybrid Physical Vapor Deposition Instrument for Advanced Functional Multilayers and Materials
Technical Report,01 Aug 2014,31 Jul 2015
North Carolina State University Raleigh United States
Pagination or Media Count:
PI Maria received support to construct a physical vapor deposition PVD system that combines electron beam e-beam evaporation, magnetron sputtering, pulsed laser ablation, and ion-assisted deposition. The instrumentation enables clean, uniform, and rapid deposition of a wide variety of metallic, semiconducting, and ceramic thin films with microstructures and composite geometries enhanced by energetic bombardment during growth.
- Manufacturing and Industrial Engineering and Control of Production Systems