Physiochemical Control of Composition and Location for Fundamental Studies of Biofouling Resistant, High Fouling Release Surfaces
Technical Report,01 May 2015,31 Mar 2016
CALIFORNIA UNIV SANTA BARBARA SANTA BARBARA United States
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This contribution describes the development of Solution Exchange Lithography as a novel, modular methodology for sequential photopatterning. Without ever removing the substrate, this approach readily combines externally regulated polymerization and subsequent post modification to dial in any desirable surface property with precise spatial control. This enables the continuous fabrication of hierarchically patterned polymer brushes with chemically complex architectures.