Instrumentation for Epitaxial Growth of Complex Oxides
Technical Report,15 Aug 2014,14 Aug 2015
Drexel University Drexel University United States
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The aim of this project was to acquire instrumentation to augment a molecular beam epitaxy MBE system used in the synthesis of complex oxide heterostructures. A RF oxygen plasma source was acquired to increase the oxidizing ability of the growth environment, an improvement that will prove critical in stabilizing materials with high oxidization states. The plasma source and accompanying electronics were purchased from Mantis Deposition, Inc and successfully installed on the MBE system. Additionally, a low noise electron source was acquired to improve in situ reflection high energy electron diffraction RHEED capabilities of monitoring thin film growth. The RHEED source was purchased from Staib Instruments and successfully installed on the MBE system. The equipment is and will be used extensively to synthesize complex oxide heterostructures for ongoing and future investigations of correlated electron behavior, electronic phase transitions, and novel electronic devices.