Flexible Micro-and Nano-Patterning Tools for Photonics
STTR Report,30 Sep 2012,14 Feb 2015
LUMARRAY INC. SOMERVILLE United States
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The specific objective of this STTR was to improve and extend the performance of LumArrays maskless photolithography system, the ZP-150, by means of 8 tasks that included enhancing the throughput improving the spatial and temporal dose uniformity dynamic tracking of the focal gap on non-flat substrates improving the efficiency of 3Dproximity-effect correction designing a phase-shifting microlens for sub-100 nm patterning writing of photonic devices, large-area computer-generated holograms and other diffractive-optical patterns. The motivation was to provide the science and engineering community with a low cost, highly flexible maskless photolithography tool that meets the needs of photonic systems for high-fidelity, long-range spatial-phase coherence, full-wafer coverage, 3D structuring, patterning on non-flat surfaces, and sub-100 nm resolution. The tool was to be compatible with both research and low-volume manufacturing of photonics, diffractive optics and electronics. This STTR responded to the DoD need for rapid turnaround on customized photonics and electronics, while also lowering cost and ensuring security.