Accession Number:

AD1006479

Title:

Flexible Micro-and Nano-Patterning Tools for Photonics

Descriptive Note:

STTR Report,30 Sep 2012,14 Feb 2015

Corporate Author:

LUMARRAY INC. SOMERVILLE United States

Personal Author(s):

Report Date:

2016-03-10

Pagination or Media Count:

15.0

Abstract:

The specific objective of this STTR was to improve and extend the performance of LumArrays maskless photolithography system, the ZP-150, by means of 8 tasks that included enhancing the throughput improving the spatial and temporal dose uniformity dynamic tracking of the focal gap on non-flat substrates improving the efficiency of 3Dproximity-effect correction designing a phase-shifting microlens for sub-100 nm patterning writing of photonic devices, large-area computer-generated holograms and other diffractive-optical patterns. The motivation was to provide the science and engineering community with a low cost, highly flexible maskless photolithography tool that meets the needs of photonic systems for high-fidelity, long-range spatial-phase coherence, full-wafer coverage, 3D structuring, patterning on non-flat surfaces, and sub-100 nm resolution. The tool was to be compatible with both research and low-volume manufacturing of photonics, diffractive optics and electronics. This STTR responded to the DoD need for rapid turnaround on customized photonics and electronics, while also lowering cost and ensuring security.

Subject Categories:

Distribution Statement:

APPROVED FOR PUBLIC RELEASE