Accession Number:

AD1004414

Title:

Epitaxial Growth of Rhenium with Sputtering

Descriptive Note:

Journal Article

Corporate Author:

National Institute of Standards and Technology Boulder United States

Personal Author(s):

• Oh,Seongshik
• Hite,Dustin A.
• Cicak,K.
• Osborn,Kevin D.
• Simmonds,Raymond W.
• McDermott,Robert
• Cooper,Ken B.
• Steffen,Matthias
• Martinis,John M.
• Pappas,David P.

Report Date:

2016-05-06

Pagination or Media Count:

26.0

Abstract:

We have grown epitaxial Rhenium Re 0001 films on -Al2O3 0001 substrates using sputter deposition in an ultra high vacuum system. We find that better epitaxy is achieved with DC rather than with RF sputtering. With DC sputtering, epitaxy is obtained with the substrate temperatures above 700 C and deposition rates below 1 s. The epitaxial Re films are typically composed of terraced hexagonal islands with screw dislocations, and island size gets larger with high temperature post-deposition annealing. The growth starts in a three dimensional mode but transforms into two dimensional mode as the film gets thicker. With a thin 2 nm seed layer deposited at room temperatureand annealed at a high temperature, the initial three dimensional growth can be suppressed. This results in larger islands when a thick film is grown at 850 C on the seed layer. We also find that when a room temperature deposited Re film is annealed to higher temperatures, epitaxial features start to show up above 600 C, but the film tends to be disordered.

Descriptors:

• RHENIUM
• EPITAXIAL GROWTH
• SPUTTERING
• THIN FILMS
• SUBSTRATES
• VACUUM DEPOSITION
• HIGH TEMPERATURE

Subject Categories:

Distribution Statement:

APPROVED FOR PUBLIC RELEASE