Microfabrication Techniques for Millimeter Wave Vacuum Electronics
U.S. Naval Research Laboratory Washington United States
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The principal challenge for creating vacuum electron devices in the millimeter-wave mmW frequency range is accurate fabrication of slow-wave circuits and other electromagnetic features with tight tolerance. Ultraviolet Photolithography and Electroforming UVLIGA techniques are presented that allow tight tolerance control for slow wave circuits for the mmW and sub-mmW bands. We show how these techniques were applied at the W- and G-bands.