Accession Number:

AD1004171

Title:

Microfabrication Techniques for Millimeter Wave Vacuum Electronics

Descriptive Note:

Technical Report

Corporate Author:

U.S. Naval Research Laboratory Washington United States

Personal Author(s):

• Joye,Colin D.
• Cook,Alan M.
• Calame,Jeffrey P.
• Abe,David K.
• Nguyen,Khanh T.
• Wright,Edward L.
• Hanna,Jeremy M.
• Chernyavskiy,Igor A.
• Levush,Baruch

Report Date:

2015-01-01

Pagination or Media Count:

2.0

Abstract:

The principal challenge for creating vacuum electron devices in the millimeter-wave mmW frequency range is accurate fabrication of slow-wave circuits and other electromagnetic features with tight tolerance. Ultraviolet Photolithography and Electroforming UVLIGA techniques are presented that allow tight tolerance control for slow wave circuits for the mmW and sub-mmW bands. We show how these techniques were applied at the W- and G-bands.

Descriptors:

• PHOTOLITHOGRAPHY
• MILLIMETER WAVES
• TRAVELING WAVE TUBES

Subject Categories:

Distribution Statement:

APPROVED FOR PUBLIC RELEASE