Production Engineering Measure for an Electron-Beam Machine and Microwave Transistors.
Quarterly rept. no. 4, 1 Jan-1 Apr 72,
TEXAS INSTRUMENTS INC DALLAS
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The objective of this program is to establish and demonstrate, under production conditions, the use of electron-beam photolithography in the fabrication of integrable microwave transistors. During the fourth quarter of the contract, slice lot EBT-5 was processed to completion. A complete evaluation of this lot was made, and 20 engineering samples were shipped along with test results. Several units had maximum available gain as high as 7.24 dB at 6 GHz. A new transistor, ML-220, was designed to utilize the slower etch rate of electron-beam irradiated gold and the e-beam machines small-geometry capability. Several lots of slices containing this new, potentially superior transistor were started. Automatic pattern registration was utilized on approximately 50 of the fields to further evaluate this operation on slices going through the transistor fabrication steps. Author
- Electrical and Electronic Equipment
- Fabrication Metallurgy
- Particle Accelerators