Accession Number:

AD0900280

Title:

Production Engineering Measure for an Electron-Beam Machine and Microwave Transistors.

Descriptive Note:

Quarterly rept. no. 3, 1 Oct 71-1 Jan 72,

Corporate Author:

TEXAS INSTRUMENTS INC DALLAS

Personal Author(s):

Report Date:

1972-01-01

Pagination or Media Count:

38.0

Abstract:

Significant steps were made toward establishing a fully computer-controlled electron-beam delineation capability for fabrication of microwave transistors. The first lot of slices EBT-1 was processed through all the microwave transistor masking levels to establish electron resist and etching processes. Significant problems were not encountered using PMMA RESIST UNTIL THE CONTACT MASKING LEVEL. A CHANGE IN THE ETCH RATE OF THE SPUTTERED GOLD DUE TO ELECTRON-BEAM IRRADIATION CAUSED SEVERE UNDERCUTTING OF THE EMITTER FINGERS USING PMMA and conventional chemical etching techniques. A negative electron resist polystyrene was utilized on Lot EBT-5 to take advantage of this etch rate differential. Polystyrene enabled delineation of 0.7 m emitter contact fingers on all slices in this lot. Evaluation of the transistors from Lot EBT-5 is in progress. Excellent progress was made this quarter toward fully automating pattern registration for fabrication of 6 GHz transistors. Lots EBT-4 and EBT-5 were used to test the alignment capability of the automatic pattern registration APR system on wafers going through the 6 GHz transistor process. Another major step toward fully computer- controlled e-beam delineation was accomplished through assembly and check-out of the electrical and mechanical hardware necessary for the step-and-repeat operation. Author, modified-PL

Descriptors:

Subject Categories:

  • Electrical and Electronic Equipment
  • Particle Accelerators

Distribution Statement:

APPROVED FOR PUBLIC RELEASE


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