An Improved Capability for Electron Beam Area Definition.
Final rept. 3 Nov 69-2 Oct 70,
WESTINGHOUSE RESEARCH LABS PITTSBURGH PA
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The broad objective of this program was to improve certain aspects of the Electron Image Projection System for the production of high density integrated circuits. An automatic alignment system was developed to allow percise alignments of electron images of integrated circuit patterns to previously existing patterns on silicon wafers. Typical best performance involved accuracies to plus or minus 14 micron in times of 2 to 5 seconds. Factors affecting photocathode sensitivity and life-time were investigated leading to improvements in both aspects. A UV source containing cadmium was developed. Author
- Electrical and Electronic Equipment
- Manufacturing and Industrial Engineering and Control of Production Systems