Accession Number:

AD0885549

Title:

An Improved Capability for Electron Beam Area Definition.

Descriptive Note:

Final rept. 3 Nov 69-2 Oct 70,

Corporate Author:

WESTINGHOUSE RESEARCH LABS PITTSBURGH PA

Personal Author(s):

• O'Keeffe, Terence W.

Report Date:

1971-03-01

Pagination or Media Count:

105.0

Abstract:

The broad objective of this program was to improve certain aspects of the Electron Image Projection System for the production of high density integrated circuits. An automatic alignment system was developed to allow percise alignments of electron images of integrated circuit patterns to previously existing patterns on silicon wafers. Typical best performance involved accuracies to plus or minus 14 micron in times of 2 to 5 seconds. Factors affecting photocathode sensitivity and life-time were investigated leading to improvements in both aspects. A UV source containing cadmium was developed. Author

Descriptors:

• (*MASKING
• ELECTRON BEAMS)
• (*INTEGRATED CIRCUITS
• MASKING)
• IMAGES
• PHOTOCATHODES
• ULTRAVIOLET RADIATION
• ALIGNMENT
• SILICON

Subject Categories:

• Electrical and Electronic Equipment
• Manufacturing and Industrial Engineering and Control of Production Systems

Distribution Statement:

APPROVED FOR PUBLIC RELEASE