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Monolithic Infrared Mosaic Sensors (3rd Year).
Final technical rept. 16 Nov 69-31 Jan 71,
WESTINGHOUSE ELECTRIC CORP DAYTON OH
Pagination or Media Count:
The processing techniques and methods used to fabricate 100- x 178-element mosaics of germanium pnp phototransistors are presented. The use of a potassium cyanide soak as a prethermal treatment is described. The procedures for growing epitaxial layers of high quality are described as well as methods of controlling arsenic diffusion. Attention is given to many of the problems encountered and the solutions arrived at during this 3-year program. Author
APPROVED FOR PUBLIC RELEASE