Manufacturing Techniques for Application of a Duplex W/Si-W Coating on Tantalum Components.
Final rept. 1 Aug 66-30 Jun 70,
TRW INC CLEVELAND OH
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The report summarizes the results of a program to establish manufacturing techniques for applying the duplex WSi-W coating on tantalum components. The duplex WSi-W coating consists of an integrally bonded tungsten barrier layer interposed between an oxidation resistant tungsten disilicide surface coating and the tantalum alloy substrate. The tungsten barrier layer was applied using different techniques, e.g., chemical vapor deposition, slurry spray, or electrophoretic deposition, each followed by vacuum sintering. The silicide coating was formed by either vacuum-pack or slip-pack processes. Author
- Coatings, Colorants and Finishes
- Fabrication Metallurgy