MICROWAVE ELECTRONICALLY VARIABLE ION BEAM TIME DELAY DEVICE STUDY.
Interim rept. no. 3, Dec 66-Feb 67,
MICROWAVE ASSOCIATES INC BURLINGTON MA
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Studies conducted this quarter on the ion-beam variable delay line are reported. Emphasis is placed on the ion sources and coupler theory and test. High percentage active material emitters sintered at 1400 C appear to give longer life the life test behavior of ion current emission can be approximately explained by diffusion of active material from a finite slug. Secondary electron emission due to ion bombardment of metals has also been investigated. A threshold ion energy is found and the emission appears to be governed by the alkali-atom coverage of the metals. No significant yield is found for ions of about 500 eV energy. Ion beams of density 4-5 mAsq cm have been extracted from a plasma, with a spreading governed by space charge neutralization and ion-atom collisions. The coupler theory is summarized as a coupling matrix, with numerical results included. Oscillation in a 10-gap coupler is found to be unlikely. Additional tests on the 50 MHz coupler have been performed. Conclusions and future plans are given. Author
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