Accession Number:

AD0787291

Title:

Development of Chemical Polishing Techniques for Sapphire.

Descriptive Note:

Final rept. Apr 73-Jul 74,

Corporate Author:

LITTLE (ARTHUR D) INC CAMBRIDGE MASS

Personal Author(s):

Report Date:

1974-07-01

Pagination or Media Count:

30.0

Abstract:

The objective of this research program was to improve the surface finish of rough ground sapphire substrates by optimizing the pretreatment, the chemical polishing agent, and the polishing cycle. The optimum conditions for chemically polishing sapphire were found to be preheating of the substrate in air to 1500-1550C for four 4 hours, phosphoric acid as the chemical polishing agent, polishing at 360-400C for ten 10 minutes, and polishing under autoclave conditions. This process has application to transparent armor fabrication. Modified author abstract

Subject Categories:

  • Ceramics, Refractories and Glass
  • Manufacturing and Industrial Engineering and Control of Production Systems
  • Armor

Distribution Statement:

APPROVED FOR PUBLIC RELEASE