Development of Chemical Polishing Techniques for Sapphire.
Final rept. Apr 73-Jul 74,
LITTLE (ARTHUR D) INC CAMBRIDGE MASS
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The objective of this research program was to improve the surface finish of rough ground sapphire substrates by optimizing the pretreatment, the chemical polishing agent, and the polishing cycle. The optimum conditions for chemically polishing sapphire were found to be preheating of the substrate in air to 1500-1550C for four 4 hours, phosphoric acid as the chemical polishing agent, polishing at 360-400C for ten 10 minutes, and polishing under autoclave conditions. This process has application to transparent armor fabrication. Modified author abstract
- Ceramics, Refractories and Glass
- Manufacturing and Industrial Engineering and Control of Production Systems