Deposition Profiles by Vaporization Expansion Wave Method.
Technical rept. Jun 72-Jun 73,
BALLISTIC RESEARCH LABS ABERDEEN PROVING GROUND MD
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A scheme is presented for measurement of deposition profiles in electrically conducting materials, effective in an energy range in which the material is in the mixed liquid-vapor state. An oscillographic record of sensor resistance may be made to yield a plot of deposited energy as a function of depth in the sensor by use of a slow, vaporization-expansion wave model. The results of tests in copper and aluminum sensors are shown and steps to improve accuracy are discussed. Author
- Metallurgy and Metallography